藤田淳一の部屋(論文)＜ profile, lecture, pub, link ＞

論文リスト

英文論文

  1. "Graphitization at interface between amorphous carbon and liquid gallium for fabricating large area graphene sheets", J. Fujita, R. Ueki, Y. Miyazawa, and T. Ichihashi, J. Vac. Soc. Technil. B27, 3063-3066(2009).
  2. "In-situ Visualization and Two Dimensional Mapping of Local Electric Field at Probe Apex Using Scanning Electron Optical System", J. Fujita, Y. keda, and I. Suzuki, Jpn. J. Appl. Phys. 48, 06FG02/4(2009).
  3. "Multilevel visualization of local electric field at probe apex using scanningelectron microscopy", J. Fujita,Y.Ikeda, and I. Suzuki, J. Vac. Sci. & Technol. B 26, 2069-2072(2008).
  4. "In situ visualization of local electric field in an ultrasharp tungsten emitter under a low voltage scanning transmission electron microscope", J. Fujita, Y. Ikeda, S. Okada, K. Higashi, and S. Nakasawa, J. Vac. Sci. & Technol. B 25, 2624-2627(2007).
  5. "Driving Force of an Iron Particle's Movement in Solid-Phase Graphitization ", K. Higashi, M. Ishida, S. Matsui, and J. Fujita, Jpn. J. Appl. Phys. 46, 6282-6285(2007).
  6. "Elastic Double Structure of Amorphous Carbon Pillar Grown by Focused-Ion-Beam Chemical Vapor Deposition", J. Fujita, S. Okada, R. Ueki1, M. Ishida, T. Kaito, and S. Matsui, Jpn. J. Appl. Phys. 46, 6286-6289(2007).
  7. "In-situ Visualization of Local Field Enhancement in an Ultra Sharp Tungsten Emitterunder a Low Voltage Scanning Transmission Electron Microscope", J. Fujita, Y. Ikeda, S. Okada, K. Higashi, S. Nakazawa, M. Ishida, and S. Matsui, Jpn. J. Appl. Phys. 46, 498-501(2007).
  8. "Graphitic tube transformation of FIB-CVD pillar by Joule heating with flash discharge", J. Fujita, S. Nakazawa , T. Ichihashi, M. Ishida, T. Kaito, S. Matsui, Microelectronic Engineering 84, 1507-1510(2007).
  9. "Comparison of Young's Modulus Dependency on Beam Accelerating Voltage between Electron-Beam- and Focused Ion-Beam-Induced Chemical Vapor Deposition Pillars", S. Okada, T. Mukawa, R. Kobayashi, M. Ishida, Y. Ochiai, T. Kaito, S. Matsui and J. Fujita, Jpn. J. Appl. Phys. Vol.45,5556-5559 (2006).
  10. "Inducing graphite tube transformation with liquid gallium and flash discharge", J. Fujita, T. Ichihashi, S. Nakazawa, S. Okada, M. Ishida, Y. Ochiaic, T. Kaito,and S. Matsui, Appl. Phys. Lett. 88, 093109-383111/3 (2006).
  11. "Position-Controlled Carbon Fiber Growth Catalyzed Using Electron Beam-Induced Chemical Vapor Deposition Ferrocene Nanopillars", T. Mukawa, S. Okada, R. Kobayashi, J. Fujita, M. Ishida, T. Ichihashi, Y. Ochiai, T. Kaito, and S. Matsui, Jpn. J. Appl. Phys. Vol. 44, 5639-5640(2005).
  12. "Growth Manner and Mechanical Characteristics of Amorphous Carbon Nanopillars Grown by Electron-Beam-Induced Chemical Vapor Deposition", S. Okada, T. Mukawa, R. Kobayashi, J. Fujita, M. Ishida, T. Ichihashi, Y. Ochiai, T. Kaito, and S. Matsui, Jpn. J. Appl. Phys. Vol. 44, 5646-5649(2005).
  13. "Fresnel Diffraction Mirror for an Atomic Wave", H. Oberst, S. Kouznetsov, K. Shimizu, J. Fujita, and F. Shimizu, Phys. Rev. Lett. 94, 013203-1-4(2005).
  14. "In situ observation of carbon-nanopillar tubulization process", T. Ichihashi, M. Ishida, Y. Ochiai, and J. Fujita, J. Vac. Sci. Technol. B 22, 3221-3224 (2004).
  15. "In-situ Observation of Carbon Nanopillar Tublization Caused by Liquidlike Iron Particles", T. Ichihashi, J. Fujita, M. Ishida, and Y. Ochiai, Phys. Rev. Lett. 92, 215702-1/4(2004).
  16. "Graphitized Wavy Traces of Iron Particles Observed in Amorphous Carbon Nano-pillars", J. Fujita, M. Ishida, T. Ichihashi, Y. Ochiai, T. Kaito and S. Matsui, Jpn. J. Appl. Phy. 43, 3799-3802(2004).
  17. "Nanoimprint using three-dimensional microlens mold made by focused-ion-beam chemical vapor deposition", K. Watanabe, T. Morita, and R. Kometani, T. Hoshino, K. Kondo, K. Kanda, Y. Haruyama, T. Kaito, J. Fujita, M. Ishida, Y. Ochiai, T. Tajima, and S. Matsui, J. Vac Sci. Technol. B22, 22-26(2004).
  18. "Nanomanipulator and actuator fabrication on glass capillary by focused-ion-beam- chemical vapor deposition", R. Kometani, T. Morita, K. Watanabe, T. Hoshino, K. Kondo, K. Kanda, Y. Haruyama, T. Kaito, J. Fujita, M. Ishida, Y. Ochiai, and S. Matsui, J. Vac Sci. Technol. B22, 257-263(2004).
  19. "Growth of three-dimensional nanostructures by FIB-CVD and its mechanical properties", J. Fujita, M. Ishida, T. Ichihashi, Y. Ochiai, T. Kaito, and S. Matsui, Nuclear Instilments and Methods in Physics research B206, 472-477(2003).
  20. "Carbon nanopillar laterally grown with electron beam-induced chemical vapor deposition", J. Fujita, M. Ishida, T. Ichihashi, Y. Ochiai, T. Kaito, and S. Matsui, J. Vac Sci. Technol. B21, 2990-2993(2003).
  21. "Free-space-wiring fabrication in nano-space by focused-ion-beam chemical vapor deposition", T. Morita, R. Kometani, K. Watanabe, K. Kanda, and Yuichi Haruyama T. Hoshino, K. Kondo, T. Kaito, T. Ichihashi, J. Fujita, M. Ishida, Y. Ochiai, T. Tajima, and S. Matsui, J. Vac Sci. Technol. B21, 2737-2741(2003).
  22. "Development of three-dimensional pattern-generating system for focused-ion-beam chemical-vapor deposition", T. Hoshino, K. Watanabe, R. Kometani, T. Morita, K. Kanda, and Y. Haruyama, T. Kaito, J. Fujita, M. Ishida, Y. Ochiai, and S. Matsui, J. Vac Sci. Technol. B21, 2732-2736(2003).
  23. "Focused ion beam-induced fabrication of tungsten structures", M. Ishida, J. Fujita, T. Ichihashi, and Y. Ochiai, T. Kaito, and S. Matsui, J. Vac Sci. Technol. B21, 2728-2731(2003).
  24. "Graphitization of Fe-doped Amorphous Carbon Pillars Grown by FIB-CVD", J. Fujita, M. Ishida, T. Ichihashi, Y. Ochiai, T. Kaito, and S. Matsui, J. Vac. Sci. Technol. B20, 2686-2689(2002).
  25. "Reflection type Hologram for Atoms", F. Shimizu, and J. Fujita, Phys. Rev. Lett. 88, 123201/4(2002).
  26. "Giant Quantum Reflection of Neon Atoms from a Ridged Silicon Surface", F. Shimizu and J. Fujita, J. Phys. Soc. Jpn. 71, 5-8(2002).
  27. "Structure and Resonant Characteristics of Amorphous Carbon Pillars Grown by Focused-Ion-Beam -Induced Chemical Vapor Deposition", J. Fujita, M. Ishida, T. Ichihashi, T. Sakamoto, Y. Ochiai, T. Kaito, and S. Matsui, Jpn. J. Appl. Phys. 41, 4423-4426(2002).
  28. "Fourier analysis of line-edge roughness in the calixarene fine patterns", M. Ishida, J. Fujita, and Y. Ochiai, Jpn. J. Appl. Phys. 41, 4228-4232(2002).
  29. "Room temperature replication in spin on glass by nanoimprint technology", S. Matsui, Y. Igaku, H. Ishigaki, J. Fujita, M. Ishida, Y. Ochiai, M. Komuro, and H. Hiroshima, J. Vac. Sci. Technol. B19, 2801-2805(2002).
  30. "Observation and characteristics of mechanical vibration in three-dimensional nanostructures and pillars grown by FIB-CVD" J. Fujita, M. Ishida, T. Sakamoto, Y. Ochiai, T. Kaito, and S. Matsui J. Vac. Sci. Technol. B19, 2834-2837(2001).
  31. "Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition" S .Matsui, T. Kaito, J. Fujita, M. Komuro, K. Kanda, and Y. Haruyama J. Vac. Sci. Technol. B18, 3181-3184(2000).
  32. "Real time interferometric manipulation of a neutral atomic beam by electric field" F. Shimizu, J. Fujita, T. Kishimoto, and S. Mitake Can. J. Phys. 78, 529-535 (2000).
  33. "Real time pattern changing in atomic beam holography using phase shift by stark effect" J. Fujita, T. Kishimoto, S. Mitake, and F. Shimizu J. Vac. Sci. Technol. B18, 3590-3593 (2000).
  34. "High-purity, ultrahigh-resolution calixarene electron-beam negative resist" S. Manako, Y. Ochiai, H. Yamamoto, T. Teshima, J .Fujita, E. Nomura J. Vac. Sci. Technol. B18, 3424-3427 (2000).
  35. "High-resolution, high-purity cylix[n]arene electron beam resist" Y. Ochiai, S. Manako, H. Yamamoto, T. Teshima, J. Fujita, E. Nomura J. Photopolymer Sci. Technol. 13, 413-417 (2000).
  36. "Interferometric modulation of an atomic beam by an electric field: a phase hologram for atoms" J. Fujita, S. Mitake, and F. Shimizu Phys. Rev. Lett. 84, 4027-4030 (2000).
  37. "Nanometer-scale resolution of a chloromethyleated caliocatrene negative resist in electron-beam lithography : deprndence on the number of phenolic residues" T. Sakamoto, S. Manako, J. Fujita, Y. Ochiai, and T. Baba J. Appl. Phys. Lett. 77, 301-303 (2000).
  38. "Transistor characteristics of 14-nm-gate-length EJ-MOSFETs" H. Kawaura, T. Sakamoto, T. Baba, Y. Ochiai, J. Fujita, and J. Sone IEEE Trans. on Electron Devices, 47, 856-860 (2000).
  39. "Electric field modulated atomic beam holography" J. Fujita, T. Kishimoto, S. Mitake, and F. Shimizu J. Vac. Sci. Technol. B17, 2953-2956 (1999).
  40. "High resolution organic resists for charged particle lithography" Y. Ochiai, S. Manako, J. Fujita, E. Nomura J. Vac. Sci. Technol. B17, 933-938 (1999).
  41. "Gray-scale atom holography" T. Kishimoto, J. Fujita, S. Mitake, F. Shimizu Jpn. J. Appl. Phys. Lett. 38, L683-686 (1999).
  42. "Nanofabrication toward sub-10 nm and its application to novel nanodevices" J. Sone, J. Fujita, Y. Ochiai, S. Manako, S. Matsui, E. Nomura, T. Baba, H. Kawaura, T. Sakamoto, C. D. Chen, Y. Nakamura, and J. S. Tsai Nanotechnology, IOP Publishing, vol.10, no.2, 135-141 (1999).
  43. "Atomic beam holography for nanofabrication" J. Fujita, T. Kishimoto, M. Morinaga, S. Matsui, and F. Shimizu J. Vac. Sci. Technol. B16, 3855-3858 (1998).
  44. "Transistor operation of 30-nm gate-length EJ-MOSFETs" H. Kawaura, T. Sakamoto, T. Baba, Y. Ochiai, J. Fujita, S. Matsui, and J. Sone IEEE Electron Device Letters, 19, 74-76 (1998).
  45. "Material-wave nanotechnology: Nanofabrication using a de Broglie wave" S. Matsui, and J. Fujita J. Vac. Sci. Technol. B16, 2439-2443 (1998).
  46. "Sub-10-nm electron beam lithography using a poly (alpha -methylstyrene) resist with a molecular weight of 650" S. Manako, J. Fujita, K. Tanigaki, Y. Ochiai, E. Nomura Jpn. J. Appl. Phys. 37, 6785-6787 (1998).
  47. "Resolution-limit study of chain-structure negative resist by electron beam lithography" S. Manako, J. Fujita, Y. Ochiai, E. Nomura, and S. Matsui Jpn. J. Appl. Phys. Let. 36, L724-726 (1997).
  48. "Fabrication of 30 nm gate length electrically variable shallow-junction metal-oxide-semiconductor field-effect transistors using a calixarene resist" T. Sakamoto, H. Kawaura, T. Baba, J. Fujita, and Y. Ochiai, J. Vac. Sci. Technol. B15, 2806-2808 (1997).
  49. "Proposal of pseudo source and drain MOSFETs for evaluating 10-nm gate MOSFETs" H. Kawaura, T. Sakamoto, T. Baba, Y. Ochiai, J. Fujita, S. Matsui, and J. Sone, Jpn. J. Appl. Phys. 36, 1569-1573 (1997).
  50. "High Resolution EB Lithography on Organic Resists: Molecular Size Effect" Y. Ochiai, S. Manako, J. Fujita, and E. Nomura J. Photopolym. Sci. Technol. 10, 641-646 (1997).
  51. "Calixarene electron beam resist for nano-lithography" J. Fujita, Y. Ohnishi, S. Manako, Y. Ochiai, E. Nomura, T. Sakamoto, and S. Matsui Jpn. J. Appl. Phys. 36, 7769-7772 (1997).
  52. "Resolution of calixarene resist under low energy electron irradiation" J. Fujita, Y. Ohnishi, S. Manako, Y. Ochiai, E. Nomura, S. Matsui, Microelectron. Eng. (Netherlands) vol.41/42, 323-326 (Elsevier), Feb.1997.
  53. "Calixarenes-prospective materials for nanofabrications" Y. Ohnishi, J. Fujita, Y. Ochiai, and S. Matsui Microelectron. Eng. (Netherlands) vol. 35, No.1/4, 117-120, Elsevier, Feb.1996.
  54. "Nanometer-scale resolution of calixarene negative resist in electron beam lithography" J. Fujita, Y. Ohnishi, Y. Ochiai, E. Nomura, and S. Matsui J. Vac. Sci. Technol. B14, 4272-4276 (1996).
  55. "Nanometer-scale patterning of polystyrene resists in low-voltage electron beam lithography" S. Manako, J. Fujita, Y. Ochiai, E. Nomura, and S. Matsui Jpn. J. Appl. Phys. 36, 7773-7776 (1997).
  56. "Electron-beam-induced deposition of copper compound with low resistivity" Y. Ochiai, J. Fujita, and S. Matsui J. Vac. Sci. Technol. B14, 3887-3391 (1996).
  57. "Holographic manipulation of a cold atomic beam" M. Morinaga, M.Yasuda, T. Kishimoto, F. Shimizu, J. Fujita, and S. Matsui Phys. Rev. Lett. 77, 802-805 (1996).
  58. "Nature of phase transitions of superconducting wire networks in a magnetic field" X. S. Ling, H. J. Lezec, M. J. Higgins, J. S. Tsai, J. Fujita, H. Numata, Y. Nakamura, Y. Ochiai, T. Chao, P. M. Chaikin, and S.Bhattacharya Phys. Rev. Lett. 76, 2989-2992 (1996).
  59. "Manipulation of an atomic beam by a computer-generated hologram" J. Fujita, M. Morinaga, T. Kishimoto, M. Yasuda, S. Matsui, F. Shimizu Nature, 380, 691-694 (1996).
  60. "Ultrahigh resolution of calixarene negative resist in electron beam lithography" J. Fujita, Y. Ohnishi, Y. Ochiai, and S. Matsui Appl. Phys. Lett. 68, 1297-1299 (1996).
  61. "Fabrication of 40nm-gate MOSFETs by Nano-electron Beam Direct Writing" Y. Ochiai, S. Manako, S. Samukawa, J. Fujita, K. Takeuchi, and T. Yamamoto J. Photopolym. Sci. Technol. 9, 715-722 (1996).
  62. "Self-developing properties of an inorganic electron beam resist and nanometer-scale patterning using a scanning electron beam" H. Watanabe, J. Fujita, Y. Ochiai, S. Matsui, and M. Ichikawa Jpn. J. Appl. Phys. 34, 6950-6955 (1995).
  63. "Sub-10 nm lithography and development properties of inorganic resist by scanning electron beams" J. Fujita, H. Watanabe, Y. Ochiai, S. Manako, and J. S. Tsai J. Vac. Sci. Technol. B13, 2757-2761 (1995).
  64. "Thin-film anisotropic transport measurement on tilted Bi2Sr2CaCu2Ox" J. S. Tsai, J. Fujita, and M. Yu. Kupriyanov Phys. Rev. B, 51, 16267-16275 (1995).
  65. "Electron-stimulated desorption and in-situ scanning electron microscopy study on self-developing reaction of high-resolution inorganic electron beam resist" H. Watanabe, J. Fujita, Y. Ochiai, S. Matsui, and M. Ichikawa Jpn. J. Appl. Phys. Lett. 34, L948-950 (1995).
  66. "Sub-10 nm lithography and development properties of inorganic resist by scanning electron beam" J. Fujita, H. Watanabe, Y. Ochiai, S. Manako, J. S. Tsai, and S. Matsui Appl. Phys. Lett. 66, 3065-3067 (1995).
  67. "Nanofabrication of grating and dot patterns by electron holographic lithography" K. Ogai, Y. Kimura, R. Shimizu, J. Fujita, and S. Matsui J. Appl. Phys. Lett. 66,1560-1562 (1995).
  68. "Nanolithography using a chemically amplified negative resist by electron beam exposure" S. Manako, Y. Ochiai, J. Fujita, M. Samoto, and S. Matsui Jpn. J. Appl. Phys. 33, 6993-6997 (1994).
  69. "Role of sp3 defect structures in graphite and carbon nanotubes" H. Hiura, T. W. Ebbesen, J. Fujita, K. Tanigaki, and T. Takada Nature, 367, 148-151 (1994).
  70. "Synthesis of superconducting epitaxial films of Ba1-xKxBiO3 by laser ablation" Hyun-Tak Kim, A. Sumi, H. Uwe, J. Fujita, and K. Ohshima Jpn. J. Appl. Phys. 32, 4529-4534 (1993).
  71. "Spiral Growth of C-60" J. Fujita, S. Kuroshima, T. Satoh, J. S. Tsai, T. W. Ebbesen, and K. Tanigaki Appl. Phys. Lett. 63, 1008-1010 (1993).
  72. "Crystal growth of C60 thin films on layered substrates" K. Tanigaki, S. Kuroshima, J. Fujita, and T. W. Ebbesen Appl. Phys. Lett. 63, 2351-2353 (1993).
  73. "Patterns in the bulk growth of carbon nanotubes" T. W. Ebbesen, H. Hiura, J. Fujita, Y. Ochiai, S. Matsui, and K. Tanigaki Chem. Phys. Lett. 209, 83-90 (1993).
  74. "Fabrication of Josephson junctions using heteroepitaxial Bi2(Sr,Ca)3Cu2Ox / Bi2Sr2CuOy / Bi2(Sr,Ca)3Cu2Ox trilayer films" T. Satoh, J. Fujita, T. Yoshitake, and H. Tsuge Appl. Phys. Lett. 62, 1685-1687 (1993).
  75. "Transport Anisotropy in BSCCO Thin Films" J. Fujita, J. S. Tsai, and H.Tsuge Adv Supercond, vol.5, 1103-1106 (1993).
  76. "Preparation of Ba1-xKxBiO3 Thin Films by Laser Ablation" A. Sumi, H. Kim, H. Minami, H. Uwe, and J. Fujita Adv Supercond., vol.5, 995-998 (1993).
  77. "Nanometer-scale direct carbon mask fabrication using electron-beam-assisted deposition" Y. Ochiai, H. Watanabe, J. Fujita, M. Baba, S. Manako, and S. Matsui, Jpn. J. Appl. Phys. 32, 6147-6152 (1993).
  78. "Microstructure of Bi2(Sr, Ca)3Cu2Ox thin films on vicinal SrTiO3 substrates" T. Satoh, J. Fujita, T. Yoshitake, and H. Igarashi Physica C, 191, 359-362 (1992).
  79. "Ion and electron beam irradiation effects for high-Tc superconducting thin films" S. Matsui, H. Matsutera, T. Yoshitake, J. Fujita, T. Ichihashi, and M. Mito Radiation Effects and Defects in Solids, 124, 81-98 (1992).
  80. "Microstructure of Bi2(Sr,Ca)3Cu2Ox / Bi2Sr2CuOy / Bi2(Sr,Ca)3Cu2Ox trilayer films fabricated by ion beam sputtering" T. Satoh, J. Fujita, T. Yoshitake, and H. Igarashi Physica C, 183, 286-292 (1991).
  81. "In-plane anisotropic transport properties observed in epitaxial Bi2(Sr,Ca)3Cu2Ox films grown on tilted (001)SrTiO3 substrate" J. Fujita, T. Yoshitake, T. Satoh, S. Miura, H. Tsuge, and H. Igarashi Appl. Phys. Lett. 59, 2445-2447 (1991).
  82. "Dependence of structures and electrical properties on oxygen content in Nd2-xCexCuO4-y films" T. Yoshitake, T. Satoh, J. Fujita, and H. Igarashi Physica C, 174, 144-148 (1991).
  83. "Epitaxial growth study of Bi2(Sr,Ca)3Cu2Ox films on cleaved MgO substrates" J. Fujita, Y. Yoshitake, T. Satoh, and H. Igarashi Appl. Phys. Lett. 58, 1092-1094 (1991).
  84. "Microstructure of Bi2(Sr,Ca)3Cu2Ox / Bi2Sr2CuOx / Bi2(Sr,Ca)3Cu2Ox multilayer films fabricated by ion beam sputtering" T. Satoh, J. Fujita, T. Yoshitake, H. Igarashi, S. Miura, N.Matsukura, and H. Tsuge Physica C, 185, 2059-2060 (1991).
  85. "Epitaxial growth study of (Ba1-xRbx)BiO3-d films by ion beam sputtering" J. Fujita, T. Yoshitake, T. Satoh, H. Igarashi, I. Takeuchi, S. Miura, J. S. Tsai, and H. Tsuge Physica C, 185, 1979-1980 (1991).
  86. "In-situ epitaxial growth study of Bi2(Sr,Ca)3Cu2Ox films by ion beam sputtering on cleaved MgO substrates" J. Fujita, T. Yoshitake, T. Satoh, T. Ichihashi, and H. Igarashi IEEE Trans.Mag. 27, 1205-1210 (1991).
  87. "Effect of oxygen plasma annealing on superconducting properties of Bi2(Sr,Ca)3Cu2Ox and YBa2Cu3O7-d thin films" T. Yoshitake, S. Miura, J. Fujita, N. Shohata, H. Igarashi, and T. Satoh J. Appl. Phys. Lett. 56, 575-577 (1990).
  88. "In-situ epitaxial growth of Bi2(Sr,Ca)3Cu2Ox films by ion beam sputtering with an atomic oxygen source" J. Fujita, T. Yoshitake, H. Igarashi, and T. Satoh J. Appl. Phys. Lett. 56, 295-297 (1990).
  89. "As-grown superconducting Bi-Sr-Ca-Cu-O thin films by coevaporation" T. Satoh, T. Yoshitake, S. Miura, J. Fujita, Y. Kubo, H. Igarashi Appl. Phys. Lett. 55, 702-704 (1989).
  90. "Epitaxial film growths of artificial (Bi-O)/(Sr-Ca-Cu-O) layered structures" J. Fujita, T. Tatsumi, Y. Yoshitake, and H. Igarashi Appl. Phys. Lett. 54, 2364-2366 (1989).
  91. "Tunneling study of clean and oriented Y-Ba-Cu-O and Bi-Sr-Ca-Cu-O surfaces" J. S. Tsai, I. Takeuchi, J. Fujita, S. Miura, T. Terashima, Y. Bando, K. Iijima, K. Yamamoto Physica C, 157, 537-540 (1989).
  92. "High-Tc superconductor characteristics control by ion implantation" S. Matsui, H. Matsutera, T. Yoshitake, J. Fujita, and T. Satoh Nuclear Instruments & Methods in Physics Research, Section B, 39, 635-639 (1989).
  93. "Preparation of Bi-Sr-Ca-Cu-O thin film by coevaporation and its thermal stability" T. Yoshitake, J. Fujita, Y. Kubo, H. Igarashi, and T. Satoh Appl. Phys. Lett. 54, 572-574 (1989).
  94. "As-grown epitaxial Y-Ba-Cu-O films prepared by low energy oxygen ion assisting ion beam sputtering" J. Fujita, T. Yositake, A. Kamijyo, T. Satoh, and H. Igarashi, Nuclear Instruments & Methods in Physics Research, Section B, 39, 644-647 (1989).
  95. "Annealing effects for implanted Y-Ba-Cu-O superconductors" S. Matsui, Y. Ochiai, H. Matsutera, J. Fujita, Y. Yoshitake, and Y. Kubo Jpn. J. Appl. Phys. 64, 936-938 (1988).
  96. "Focused ion beam processes for high-Tc superconductors" S. Matsui, Y. Ochiai, Y. Kojima, H. Tsuge, N. Takado, K. Asakawa, H. Matsutera, J. Fujita, Y. Yoshitake, and Y. Kubo J. Vac. Sci. Technol. B6, 900-905 (1988).
  97. "Preferentially oriented epitaxial Y-Ba-Cu-O films prepared by the ion beam sputtering method" J. Fujita, T. Yoshitake, A. Kamijyo, T. Satoh, and H. Igarashi J. Appl. Phys. 64, 1292-1295 (1988).
  98. "YBa2Cu3Oy superconducting thin film obtained by laser annealing" N. Aizaki, K. Terashima, J. Fujita, and S. Matsui Jpn. J. Appl. Phys. Lett. 27, L231-233 (1988).
  99. "Composition effects on properties of the perovskite superconductor Ba(Pb, Bi)O3" T. Sakudo, H. Uwe, T. Suzuki, J. Fujita, J. Shiozawa, M. Isobe J. Phys. Soc. Jpn. 55, 314-316(1986).

総説・解説

  1. "原子線ホログラフィ" 藤田淳一、森永実、清水富士夫 光学（日本光学会）Vol27,268(1998).
  2. "原子線ホログラフィ" 藤田淳一、森永実、岸本哲夫、安田正美、松井真二、清水富士夫 光技術コンタクト誌、Vol 35, 107(1997).
  3. "原子線ホログラフィ" 森永実、藤田淳一、松井真二、清水富士夫 応用物理学会誌, Vol. 65,912(1996).
  4. "原子波ホログラフィ" 藤田淳一、清水富士夫 ＯPlusＥ誌、Vol. 21, 1347(1999).
  5. "カーボンナノチューブエレクトロニクス" 藤田淳一 有機エレクトロニクス材料研究会　Vol. 10, 1135(2002)
  6. "集束イオンビームによるナノ立体構造形成と機械的特性" 藤田淳一 In printing 材料科学会　Vol. 39,No5,(2002)
  7. "原子波ホログラフィ技術と応用" 藤田淳一 In printing オーム社ナノテクノロジーハンドブック

藤田淳一の部屋(論文)＜ profile, lecture, research, pub, link ＞
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