Nano Technology & Nano Science 筑波大学 物理工学系 村上・牧村・深田研究室

Semiconductors and Nanoscience | Laser Ablation | Books | 随想

  • "Segregation Behaviors and Radial Distribution of Dopant Atoms in Silicon Nanowires" N. Fukata, S. Ishida, S. Yokono, R. Takiguichi, J. Chen, T. Sekiguchi, and K. Murakami Nano Lett. 11, 651-656 (2011)
  • 村上浩一 「Si結晶における水素の侵入過程と状態」真空vol.53,No.4, 265-270(2010)
  • "Isotope Effect of Penetration of Hydrogen and Deuterium into Silicon through Si/SiO2 Interface"K. Murakami, N. Fukata, K. Ishioka, M. Kitajima3, N. Uchida, K. Morisawa, H. Morihiro, R. Shirakawa, and M. Tsujimura, Jpn. J. Appl. Phys. 48, 091204-1~4 (2009).
  • "Electronic States of P Donors in Si Nanocrystals embedded in amorphous SiO2 layer studied by Electron Spin Resonance Hydrogen Passivation Effects" Kouichi Murakami, Masatoshi Tsujimura, Ryota Shirakawa, Noriyuki Uchida, and Naoki Fukata, Jpn. J. Appl. Phys. 48, 081201-1~6 (2009).
  • "Phosphorus Ion Implantation in Silicon Nanocrystals embedded in SiO2" Kouichi Murakami, Ryota Shirakawa, Masatoshi Tsujimura, Noriyuki Uchida, Naoki Fukata, and Shun-ichi Hishita, J. Appl. Phys.105, 054307-1~5 (2009).
  • "Codoping of boron and phosphorus in silicon nanowires synthesized by laser ablation" N. Fukata,_ M. Mitome, Y. Bando, M. Seoka, S. Matsushita, K. Murakami, J. Chen, and T. Sekiguchi Appl. Phys. Lett. 93, 203106(2008).
  • "Impurity doping in silicon nanowires synthesized by laser ablation" N. Fukata, S. Matsushita, N. Okada, J. Chen, T. Sekiguchi, N. Uchida, and K. Murakami: Appl. Phys. A. 93, 589-592 (2008).
  • "Phonon confinement and impurity doping in silicon nanowires synthesized by laser ablation" N. Fukata, T. Oshima, N. Okada, S. Matsushita, T. Tsurui, J. Chen, T. Sekiguchi, and K. Murakami: Solid State Phenom. 131-133, 553-558 (2008).
  • "Formation of Si nanocrystallites observed by in situ transmission electron microscopy and their effect on the enhancement of Er photoluminescence in Er-doped SiO2" N. Fukata, H. Morihiro, R.Shirakawa, K. Murakami, M. Mitome and Y. Bando; J. Appl. Phys. 102, 114309(1-4) (2007)
  • "Hydrogen passivation of P donors and defects in P-doped silicon nanowires synthesized by laser ablation" N. Fukata, S. Matsushita, T. Tsurui, J. Chen, T. Sekiguchi, N. Uchida, and K. Murakami: Physica B 401-402, 523-526 (2007).
  • "Passivation and reactivation of carriers in B- and P-doped Si treated with atomic hydrogen" N. Fukata, S. Sato, S. Fukuda, K. Ishioka, M. Kitajima, T. Hishita, and K. Murakami: Physica B 401-402, 175-178 (2007).
  • "Phosphorus doping and hydrogen passivation of donors and defects in silicon nanowires synthesized by laser ablation" N. Fukata, J. Chen, T. Sekiguchi, S.Matsushita, T.Oshima, N.Uchida, K. Murakami, T. Tsurui, and S. Ito: Appl. Phys. Lett. 90 ,153117-1~3(2007).
  • "Dopant dependence on passivation and reactivation of carrier after hydrogenation" N. Fukata , S. Sato, H. Morihiro, K. Murakami , K. Ishioka, M. Kitajima, and S. Hishita; J. Appl. Phys. 101, 046107-1~3 (2007)
  • "Enhancement of photoluminescence of Er and Si nanocrystallites in Er-doped SiO2 by hydrogen passivation", N. Fukata, C. Li, H. Morihiro, K. Murakami, M. Mitome, and Y. Bando: Appl. Phys. A 84, 395-401 (2006).
  • "Phonon confinement in silicon nanowires synthesized by laser ablation method", N. Fukata, T. Oshima, N. Okada, T. Kizuka, T. Tsurui, S. Ito and K. Murakami: Physica B376-377,864-867(2006).
  • "Hydrogen-boron complexes in heavily boron doped silicon treated with high concentration of hydrogen atoms", N. Fukata, S. Fukuda, S. Sato, K. Ishioka, M. Kitajima, S. Hishita, and K. Murakami: Physica B376-377, 85-88(2006)..
  • "First-principle molecular dynamics study of bond disruption and formation in SiO2 upon irradiation" Mauro Boero, A. Oshiyama, P.L. Silverstrelli, and K. Murakami, Physica B376-377,945-949 (2006).
  • "Phonon confinement and self-limiting oxidation effect of silicon nanowires synthesized by laser ablation"N. Fukata , T. Oshima, N. Okada, K. Murakami , T. Kizuka, T. Tsurui and S. Ito ; J. Appl. Phys. 100, 024311-1~7 (2006)
  • "Doping and hydrogen passivation of B in silicon nanowires synthesized by laser ablation", N. Fukata, J. Chen, T. Sekiguchi, N. Okada, K. Murakami, T. Tsurui, and S. Ito: Appl. Phys. Lett. 89,203109-1~3(2006).
  • "Formation of hydrogen-boron complexes in boron-doped Si treated with a high concentration of hydrogen atoms" N. Fukata, S. Fukuda, S. Sato, K. Ishioka, M. Kitajima, T. Hishita, and K. Murakami ; Phys. Rev. B 72, 245209(1-8) (2005).
  • "Synthesis of silicon nanowires using laser ablation method and their manipulation by electron beam", N. Fukata, T. Oshima, T. Tsurui, S. Ito and K. Murakami: Sci. Tech. Adv. Matter. 6, 628-632 (2005).
  • K. Ishioka, N. Umehara, S. Fukuda, T. Mori, S. Hishita, I. Sakaguchi, H. Haneda, M. Kitajima, and K. Murakami, "Formation Mechanism of Interstitial Hydrogen Molecules in Crystalline Silicon" Jpn,. J. Appl. Phys. 42, 5410 (2003).
  • A.Uedono, T. Mori, K. Morisawa, K. Murakami, T. Ohdaira, R. Suzuki, T. Mikado, K. Ishioka, M. Kitajima, S. Hishita, H. Haneda, and I. Sakaguchi, "Hydrogen-terminated Defects in Ion-Implanted Silicon probed by Monoenergetic Positron Beams" J. Appl. Phys. 93, 3228-3233 (2003).
  • M. Fujii, A, Mimura, S. Hayashi, Y. Yamamoto, and K. Murakami, "Hyperfine Structure of Electron Spin Resonance of Phosphorus Doped Si Nanocrystals" Phys. Rev. Letters 89, 206805-1~4 (2002).
  • K. Murakami, K. Ishioka, M. Kitajima, S. Tateishi, K. Nakanoya, T. Mori, and S. Hishida, "A New Type of Hyfrogen Molecules in Silicon" Physica B 273-274, 188 - 191 (1999).
  • K. Ishioka, M. Kitajima, S. Tateishi, K. Nakanoya, N. Fukata, T. Mori, K. Murakami and S. Hishita
    "Hydrogen molecules trapped by multivacancies in silicon ",
    Phys. Rev. B60, 10852(1999).
  • M. Kitajima, K. Ishioka, K. Nakanoya, S. Tateishi, T. Mori, N. Fukata, K. Murakami and S. Hishita
    "Three Different Forms of Hydrogen Molecules in Silicon ",
    Jpn. J. Appl. Phys. 38 Express Letters, L691-L693(1999).
  • M. Kitajima, K. Ishioka, S. Tateishi, K Nakanoya, N. Fukata, K. Murakami, S. Fujimura, S. Hishita, M. Komatsu and H. Haneda
    "Effects of crystal disorder on the molecular hydrogen formation in silicon",
    Materials Science and Engineering B58, 13-16 (1999).
  • K. Murakami, K. Ishioka, M. Kitajima, S. Tateishi, K. Nakanoya, T. Mori, and S. Hishida,
    "A New Type of Hyfrogen Molecules in Silicon",
    Proc. 20the ICDS (Berkerley,1999).
    Physica B 273-274, 188(1999).
  • M. Kitajima, K. Ishioka, K. Murakami, K. Nakanoya, N. Fukata, and T. Mori,
    "Temperature Dependence of the Formation of hydrogen Molecules in n- and p-type Silicon",
    Proc. 20the ICDS (Berkerley,1999).
    Physica B 273-274, 192(1999).
  • T. Ishiyama, E. Katayama, K. Murakami, K. Takahei and A. Taguchi,
    "Electron spin resonance of Er-oxygen complexes in GaAs grown by metal organic chemical vapor deposition",
    J. Appl. Phys. 84(12), pp.6782-6787 (1998)
  • 村上
    "結晶シリコン中の水素分子と水素複合体中心",
    固体物理 33(9), 735-745 (1998)
  • T. Ishiyama, K. Murakami, K. Takahei and A. Taguchi,
    "4f-shell configuration of Yb in InP studied by electron spin resonance",
    J. Appl. Phys. 82(9), pp.4457-4460(1997)
  • M. Kitajima, K. Ishioka, K.G. Nakamura, N. Fukata, K. Murakami, J. Kikuchi and S. Fujimura,
    "Hydrogen Molecules in Crystalline Silicon"(Invited Paper),
    Proc. 19th ICDS (Aveiro, July, 1997);
    Materials Science Forum, 258-263, pp. 203-210 (1997).
  • N. Fukata, K. Murakami, K. Ishioka, K.G. Nakamura, M. Kitajima, H. Haneda, S. Fujimura, and J. Kikuchi,
    "Thermal Stability of Hydrogen Molecules in Crystalline Silicon",
    Proc. 19th ICDS (Aveiro, July, 1997);
    Materials Science Forum, 258-263, pp. 211-216 (1997).
  • K. Ishioka, K.G. Nakamura, M. Kitajima, N. Fukata, K. Murakami, J. Kikuchi and S. Fujimura,
    "Trapping Site of Hydrogen Molecules in Crystalline Silicon",
    Proc. 19th ICDS (Aveiro, July, 1997);
    Materials Science Forum, 258-263, pp.235-240 (1997).
  • 深田, 佐々木, 村上, 石岡, 中村, 北島, 菊地, 藤村, 羽田,
    「水素原子処理シリコン結晶中の水素分子」
    表面科学 18, 8, pp. 495 - 500 (1997).
  • N. Fukata, S. Sasaki, K. Murakami, K. Ishioka, K.G. Nakamura, M. Kitajima, S. Fujimura, J. Kikuchi and H. Haneda,
    "Hydrogen Molecules in Defective Silicon",
    Jpn. J. Appl. Phys. 36, pp. L1456-L1459 (1997).
  • N. Fukata, S. Sasaki, K. Murakami, K. Ishioka, K.G. Nakamura, M. Kitajima, S. Fujimura, J. Kikuchi and H. Haneda,
    "Hydrogen Molecules and Hydrogen-related Defects in Crystalline Silicon",
    Phys. Rev. B56, 11, pp. 6642- 6647 (1997).
  • K. Ishioka, K.G. Nakamura, M. Kitajima, N. Fukata, S. Sasaki, K. Murakami, S. Fujimura, J. Kikuchi, and H. Haneda,
    "Raman Spectroscopic Study on Hydrogen Molecules in Crystalline Silicon Treated with Atomic Hydrogen",
    Appl. Surf. Sci. 117/118, pp. 37-41(1997).
  • K.G. Nakamura, K. Ishioka, M. Kitajima, and K. Murakami,
    "AB INITIO CALCULATION OF THE HYDROGEN MOLECULE IN SILICON",
    Solid State Commun. 101, 10, pp. 735-738 (1997).
  • K. Murakami, N. Fukata, Fukata, S. Sasaki, K. Ishidoka, K.G. Nakamura, M. Kitajima, , S. Fujimura, J. Kikuchi and H. Haneda
    "Formation of Hydrogen Molecules in Crystalline Silicon Treated with Atomic Hydrogen",
    Mat. Res. Soc. Symp. Proc. vol.442, 269 - 274 (1997).
  • K.G. Nakamura, K. Ishioka, M. Kitajima, and K. Murakami
    "Hydrogen Molecules in Silicon Crystal",
    Mat. Res. Soc. Symp. Proc. vol.469, 229- 232 (1997).
  • K. Murakami, N. Fukata, S. Sasaki, K. Ishioka, M. Kitajima, S. Fujimura, J. Kikuchi, and H. Haneda,
    "Hydrogen Molecules in Crystalline Silicon treated with Atomic Hydrogen",
    Phys. Rev. Lett. 77, 15, pp. 3161- 3164 (1996).
  • N. Fukata, S. Sasaki, K. Murakami, K. Ishioka, M. Kitajima, S. Fujimura, and J. Kikuchi,
    "Formation of Hydrogen Molecules in n-Type Silicon",
    Jpn. J. Appl. Phys. 35 pp. L1069-L1071 (1996).
  • K. Murakami, T. Ohyanagi and K. Masuda, "Shallow Donor Clusters in InP" Jpn. J. Appl. Phys. 33, 4513 - 4520 (1994).
  • K. Murakami, H. Suhara, S. Fujita, and K. Masuda,
    "Hydrogen States Probed by Electron Spin Resonance of Phosphorus Donors in Silicon ",
    Phys. Rev. B 44, 3409 - 3412 (1991).
  • K. Murakami, H. Kuribayashi, and K. Masuda,
    "Motional Effects between On-center and Off-center Substitutional Nitrogen in Silicon",
    Phys. Rev. B 38, 1589 - 1592 (1988).
  • "Site-selective formation of Si nanocrystal in SiO2 by femtosecond laser irradiation and Al deoxidization effects, N. Uchida, Y. Mikami, H. Kintoh, K. Murakami, N. Fukata, M. Mitome, M. Hase, and M. Kitajima; Appl. Phys. Lett. 92, 153112 (2008)
  • "Ablation of Inorganic materials using Laser Plasma Soft X-rays, T. Makimura, T. Fujimori, S. Uchida, and K. Murakami; Proc. SPIE , vol.6586,658609(2007)
  • "1.5μm light emission of Er3+ ions in SiO2 films including Si nanocrystallites and in SiOx films, Tetsuya Makimura, Hiroshi Uematsu, Yuuki Okada, and Kouichi Murakami; Journal of Physics 59, 466-469(2007)
  • "Direct Nanomachining of Inorganic Transparent Materials Using Laser Plasma Soft X-Rays, Tetsuya Makimura, Hisao Miyamoto, Satoshi Uchida, Hiroyuki Niino, and Kouichi Murakami; Journal of Physics 59, 279-284 (2007)
  • "Synthesis of Silicon Nanocrystals in Aluminum Doped SiO2 Film by Laser Ablation Method" N. Uchida, T. Okami, H. Tagami, N. Fukata, and K. Murakami Physica E 38,31-35(2007).
  • "レーザプラズマ軟X線による無機透明材料のアブレーション加工" 牧村哲也, 内田智, 藤森隆成, 新納弘之, 村上浩一 電気学会誌 127,179-184(2007)
  • "Micromachining of inorganic transparent materials using pulsed laser plasma soft X-rays at 10 nm", Tetsuya Makimura, Youichi Kenmotsu, Hisao Miyamoto, Satoshi Uchida Hiroyuki Niino, and Kouichi Murakami, Proc. SPIE 5713, 9-20 (2005)
  • "Direct Micromachining of Inorganic Transparent Materials Using Laser Plasma Soft X-Rays" Tetsuya Makimura, Hisao Miyamoto, Satoshi Uchida, Hiroyuki Niino, and Kouichi Murakami; Conference proceeding series of Institute of Pure and Applied Physics (in press) Proc. The 8th International Conference on X-ray Microscopy (July 26-30, 2005, Egret Himeji)
  • "Silica Nanomachining Using Laser Plasma Soft X-Rays" Tetsuya Makimura, Satoshi Uchida, Kouichi Murakami, and Hiroyuki Niino ; Appl. Phys. Letters 89, 101118-1?3(2006).  
  • "Nano-Ablation of Inorganic Materials Using Laser Plasma Soft X-Rays at around 10 nm" Tetsuya Makimura, Hisao Miyamoto, Satoshi Uchida, Takashige Fujimori, Hiroyuki Niino, and Kouichi Murakami; Japanese Journal of Applied Physics 45, 5545?5547(2006)
  • "レーザーとナノ物性 −レーザーアブレーションで創製したSiナノ構造の物性−" 村上浩一、牧村哲也、深田直樹、レーザー研究 33, 5?11(2005).
  • "Ablation of silica glass using pulsed laser plasma soft x-rays" T. Makimura, Y. Kenmotsu, H. Miyamoto, H. Niino, K. Murakami Surface Science 593, 248-251 (2005)
  • N. Fukata, T. Oshima, K. Murakami, T. Kizuka, T. Tsurui, and S. Ito, "Phonon confinement effect of silicon nanowires synthesised by laser ablation" Appl. Phys. Letters 86, 213112 (2005).
  • T. Makimura, H. Miyamoto, Y. Kenmotsu, K. Murakami, and H. Niino, "Direct micromaching of quartz glass plates using puslsed laser plasma soft X-rays" Appl. Phys. Letters 86, 103111 (2005).
  • Mauro Boero, A. Oshiyama, P.L. Silverstrelli, and K. Murakami, "Free energy molecular dynamics simulations of pulsed-laser-irradiated SiO2 : Si-Si bond formation in a matrix of SiO2" Appl. Phys. Letters 86, 201910 (2005).
  • T. Makimura, S. Mitani, Y. Kenmotsu, K. Murakami, M. Mori, and K. Kondo, "Quartz micromachining using laser plasma soft X rays and ultraviolet laser light" Appl. Phys. Letters 85, 1274 (2004).
  • 水田泰治, 牧村哲也, 村上浩一, "レーザーアブレーションによる可視発光Siナノ微粒子の生成ダイナミックスと表面修飾" レーザ加工学会誌 (Journal of Japan Laser Processing Society) Vol.10,No.3 45-52 (2003).
  • 村上浩一, "講座:レーザーアブレーションの物理と応用 2. レーザー光と固体との相互作用" J. Plasma Fusion Res. Vol.79, 1035-1042(2003).
  • T. Makimura,K. Knodo, H. Uematsu, C. Li and K. Murakami, "Optical Excitation of Er Ions with 1.5 m Luminescence via the Luminescent State in Si Nanocrystallites embedded in SiO2 Matrices" Appl. Phys. Letters 83, 5422-5424(2003).
  • N. Fukata, Y. Yamamoto, K. Murakami, M. Hase, and M. Kitajima, "In situ Spectroscopic Measurement of Transmitted Light related to Defect Formation in SiO2 during Femtosecond Laser Irradiation" Appl. Phys. Letters 83, 3495 (2003).
  • M. Fujii, A, Mimura, S. Hayashi, Y. Yamamoto, and K. Murakami, "Hyperfine Structure of Electron Spin Resonance of Phosphorus Doped Si Nanocrystals" Phys. Rev. Letters 89, 206805-1?-4 (2002).
  • T. Mizuta, D. Takeuchi, T. Makimura and K. Murakami, "Chemical Reaction of Si Nanoparticles during Formation in Gas Phase observed by a Time-Resolved Photoluminescence Method" Jpn. J. Appl. Phys. 41, 5739-5744 (2002).
  • T.Makimura, Y.Yamamoto, S.Mitani, T.Mizuta, C.Q.Li, D.Takeuchi, K.Murakami,
    "Phosphorus-doped Si nanocrystallites embedded in SiO2 films"
    Appl. Surf. Sci. 197-198 (2002) 670-673.
  • D.Takeuchi, T.Mizuta, T.Makimura, S.Yoshida, M.Fujita, K.Hata, H.Shigekawa and K.Murakami,
    "Deposition dynamics of droplet-free Si nanoparticles in Ar gas using laser ablation"
    Appl. Surf. Sci. 197-198 (2002) 674-678.
  • T.Mizuta, D.Takeuchi, Y.Kawaguchi, T.Makimura and K.murakami,
    "Hydrogenation dynamics of Si nanoparticles with green photoluminescence"
    Appl. Surf. Sci. 197-198 (2002) 574-576.
  • T.Mizuta, D.Takeuchi, T.Makimura and K.Murakami,
    "Chemical reaction of Si nanoparticles during formation in gas phase observed by a time-resolved photoluminescence method"
    Jpn. J. Appl. Phys. 41,(2002)5739-5744
  • T.Makimura, T.Mizuta and K.Murakami,
    "Laser ablation synthesis of hydrogenated silicon nanoparticles with green photoluminescence in the gas phase"
    Jpn. J. Appl. Phys. 41 (2002) L144-L146
  • T.Makimura, T.Mizuta and K.Murakami,
    "Formation dynamics of silicon nanoparticles after laser ablation studied using plasma emission caused by second-laser decomposition"
    Appl. Phys. Lett. 76, 1401 (2000).
  • 宮下敦巳, 依田修, 村上浩一, "レーザープラズマ軟X線吸収分光を用いたアブレーション粒子の時間分解測定" 表面科学 20巻 Cpp.180-185 (1999).
  • T. Makimura, T. Mizuta, T. Ueda, and K. Murakami,
    "Formation Process of Si Nanoparticles Formed by Laser Ablation Method ",
    Mat. Res. Soc. Symp. Proc. vol.536, 51-56 (1999).
  • K. Murakami,
    "Synthesis of Si Nanopapaarticles with Visible Photoluminescence and Dynamics of Laser Ablation", (Invited Paper)
    PCPM'99 (International Symposium on Photoreaction Control and Photofunctional Materials, Tsukuba, 1999)
    Extended Abstracts pp.47-50.
  • K. Murakami, T. Suzuki, T. Makimuraa, and M. Tamura,
    "Si nanocrystallites in SiO2 with Intense Visible Photoluminescence (PL) Synthesized from SiOx Films Deposited by Laser Ablation ",
    Proc. 6th COLA (The 6th Conference On Laser Ablation,Geottingen, 1999) in Press.
  • T. Makimura, T. mizuta, and K. Murakami,
    " Formation Process of Si Nanoparticle in Rare Gas observed by a Decomposition Method ",
    Proc. 6th COLA (The 6th Conference On Laser Ablation,Geottingen, 1999) in Press.
  • 村上, 牧村,
    "可視発光シリコンナノ微粒子 ──レーザーアブレーション──",
    応用物理 67, 817 (1998)
  • Murakami K. Makimura T. Ono N. Sakuramoto T. Miyashita A. Yoda O.
    "DYNAMICS OF SI PLUME PRODUCED BY LASER ABLATION IN AMBIENT INERT GAS AND FORMATION OF SI NANOCLUSTERS",
    Applied Surface Science. 129:368-372, 1998 May.
  • Makimura T. Kunii Y. Ono N. Murakami K.
    "SILICON NANOPARTICLES EMBEDDED IN SIO2 FILMS WITH VISIBLE PHOTOLUMINESCENCE",
    Applied Surface Science.129:388-392, 1998.
  • Russo RE. Geohegan DB. Haglund RF. Murakami K.,
    "LASER ABLATION - PREFACE",
    Appl. Surf. Sci. 129:R7-R10, 1998.
  • T. Makimura, Y. Kunii, N. Ono and K. Murakami,
    "Nano-Structured Silicon-Based Films with Visible Light Emission Synthesized by Laser Ablation",
    Proc. MRS Symposium 452, 135 - 140 (1997).
  • 牧村, 国井, 村上,
    "レーザーアブレーション法による可視発光シリコン超微粒子の作成",
    表面 34, 467-473, 1996.
  • 村上, 牧村, 宮下, 依田,
    "レーザーアブレーションの動的機構とナノクラスター生成",
    レーザー研究 24,963-970, 1996.
  • Makimura T. Kunii Y. Ono N. Murakami K.
    "VISIBLE LIGHT EMISSION FROM SIOX FILMS SYNTHESIZED BY LASER ABLATION",
    Jpn. J. Appl. Phys. 35(12B):L1703-L1705,1996.
  • Makimura T. Kunii Y. Murakami K.
    "LIGHT EMISSION FROM NANOMETER-SIZED SILICON PARTICLES FABRICATED BY THE LASER ABLATION METHOD",
    Jpn. J. Appl. Phys., 35(9A):4780-4784, 1996.
  • Makimura T. Murakami K.
    "DYNAMICS OF SILICON PLUME GENERATED BY LASER ABLATION AND ITS CHEMICAL REACTION",
    Appl. Surf. Sci. 96-8:242-250, 1996.
  • Makimura T. Sakuramoto T. Murakami K.
    "TIME-RESOLVED X-RAY ABSORPTION SPECTROSCOPY FOR LASER-ABLATED SILICON PARTICLES IN XENON GAS",
    Jpn. J. Appl. Phys. 35(6A):L735-L737,1996.
  • Ohyanagi T. Miyashita A. Murakami K. Yoda O.,
    "INITIAL PROCESS OF CLUSTER FORMATION OF LASER-ABLATED SI PARTICLES",
    Surface Review & Letters. 3(1):187-190, 1996.
  • Miyashita A. Ohyanagi T. Yoda O. Murakami K.
    "DYNAMIC OBSERVATION OF LASER-ABLATED CARBON PARTICLES USING TIME-RESOLVED X-RAY ABSORPTION SPECTROSCOPY",
    Surface Review & Letters. 3(1):191-195, 1996.
  • Ohyanagi T. Miyashita A. Murakami K. Yoda O.
    "SPUTTERING PHENOMENON INDUCED BY LASER-ABLATED PARTICLES",
    Jpn. J. Appl. Phys. Part 1 35(6A):3436-3439, 1996.
  • K. Murakami,
    "Time-Resolved Spectroscopies of Laser Processing - LAPXS and Light Emission Measurements - "(Invited Paper),
    Proc. 12th Yokohama 21st Cent. Forum on Fullerenes and Laser Processing(Yokohama, 1996) 135-142.
  • K. Murakami,
    "Dynamics of Si Laser-Ablation Studied by Time-Resolved Soft X-Ray Absorption Spectroscopy"(Invited Paper),
    Proc. Intern. Symp. on Material Chemistry on Nuclear Enveronment(Tsukuba, 1996) 115-121.
  • T. Makimura, T. Sakuramoto, Y. KuKunii, N. Ono and K. Murakami,
    "Nanometer-sized Silicon Particles Synthesized by Laser Ablation of a Silicon Target in Rare Gas",
    Transactions of Material Research Society of Japan 20, 392-395 (1996).
  • T. Ohyanagi, A. Miyashita, K. Murakami and O. Yoda, "Time-and-Space Resolved X-ray Absorption Spectroscopy of Laser Ablated Si Particles" Jpn. J. Appl. Phys. 33,2586 - 2592 (1994).
  • O. Eryu, K. Murakami, K. Masuda, A. Kasuya and Y. Nishina, "Dynamics of Laser-Ablated Particles from High Tc Superconductor YBa2 Cu3 O y" Appl. Phys. Lett. 54, 2716-2718 (1989).
  • K. Murakami, O. Eryu, K. Takita and K. Masuda, "Explosive Crystallization Starting from an Amorphous-Silicon Surface Region during Long-Pulse laser Irradiation" Phys. Rev. Lett. 59, 2203-2206 (1987).
  • K. Murakami, H.C. Gerritsen, H. van Brug, F. Bijkerk, F.W. Saris and M.J. van der Wiel, "Pulsed-Laser-Irradiated Silicon Studied by Time-Resolved X-Ray Absorption (90-300 eV)" Phys. Rev. Lett. 56, 655-658 (1986).
  • 村上浩一,
    "表面物性工学ハンドブック"小間篤ほか編 丸善 2007
    第16章 結晶成長 16.9節(16.9.1) レーザーアブレーションの基礎 686−692頁
  • 村上浩一,
    "ナノ材料科学" (オーム社、2004年9月)
    第3章 ナノ加工、ナノプロセス技術 3.2節 光ナノプロセス 75〜89頁
  • K. Murakami, A. Miyashita, and O. Yoda,
    "Laser-plasma Soft X-ray Absorption Spectroscopy of Laser-ablated Silicon and Graphite Particles":
    Mesoscopic Materials and Clusters - Their Physical and Chemical Properties -,
    edited by T. Arai et al. (Kodansha-Springer, 1999) pp.337-345.
  • 村上,
    "レーザー と固体の相互作用入": レーザーアブレーションとその応用, 11-18(コロナ社,1999).
  • 村上,
    "高密度高温プルーム中の動力学": レーザーアブレーションとその応用, 80-89(コロナ社,1999).
  • 村上, 岡田, 牧村,
    "ナノクラスター生成機構 II:気相成長": レーザーアブレーションとその応用, 215-222(コロナ社,1999).
  • 牧村, 村上,
    "Siナノクラスター:可視発光と物理機構": レーザーアブレーションとその応用, 229-236(コロナ社,1999).
  • 村上浩一,
    "イオン注入とアニ−ル": 結晶成長ハンドブック(共立出版, 1995)890-893.
  • 村上浩一,
    "ESR": 半導体計測評価事典(サイエンスフォ−ラム, 1994)362-369.
  • 升田公三, 村上浩一,
    "イオン注入": 機能薄膜プロセス技術集成(南日康夫、相沢益男編;リアライズ社、1986)133-140.
  • 村上浩一, 升田公三,
    "ビ−ムアニ−ル技術": 機能薄膜プロセス技術集成(南日康夫、相沢益男編;リアライズ社、1986)213-219.
  • K. Murakami and K. Masuda,
    "Dynamic Behavior of Picosecond and Nanosecond Pulsed Laser Annealing in Ion Implanted Semiconductors",
    edited by R.R.Alfano ( Academic Press, 1984 ) pp.171 - 195.
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Copyright (C) 2004 Murakami, Makimura, Uchida Lab., University of Tsukuba.